Cobalt Encapsulation Can Extend Copper Interconnects to the 10 nanometer lithography node for computer chips
Through years of research Applied Materials has come up with a solution that it believes can extend copper interconnects to the 10-nanometer node — namely, encapsulating the copper lines in cobalt. Today Applied Materials Endura platform is used to manufacture copper interconnects on chips by first performing a cleaning step to remove particles left over after etching, then using physical vapor deposition (PVD) to add a tantalum nitride/tantalum (TaN/T) barrier layer to prevent copper diffusion into the dielectric. Then it uses PVD to deposit a copper seed — a thin continuous layer of copper alloy — onto the TaN/T barrier. Finally the wafer goes to electroplating and polishing.
Cobalt encapsulation adds two new steps to the copper interconnection process and requires an Endura Volta CVD Cobalt tool.
(Source: Applied Materials)
Source: http://nextbigfuture.com/2014/05/cobalt-encapsulation-can-extend-copper.html
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